Patents with Abstracts
Patents with Abstracts
Imprint template, nanoimprint device and nanostructuring method
Kirchner, Ploetner and Fischer of the Technische Universitaet Dresden, Germany, developed imprint templates for use in nanoimprint lithography methods, a nanoimprint device suitable for UV nanoimprint lithography methods and a nanostructuring method for direct structuring of a UV-sensitive imprint material on a substrate. The imprint templates, nanoimprint device and nanostructuring method can be used both for ultraviolet nanoimprint lithography and for thermal nanoimprint lithography. The imprint template includes a nontransparent structured chip and a transparent substrate . An at least partially nontransparent imprint template as well as a UV source situated above the imprint template holder are used for structuring by indirect exposure by reflection of light emitted from the UV radiation source in the direction of a photoactive layer. (RDC 12/3/2012)
Nanoimprint resist, nanoimprint mold and nanoimprint lithography
Zhu et al of Tsinghua University, China, and Hon Hai Precision Industry Co., Ltd., Taiwan, developed a nanoimprint mold including a flexible body and a molding layer formed on the flexible body. The molding layer includes a plurality of protrusions and recesses. The molding layer is a polymer material polymerized via a cross linking polymerization of a nanoimprint resist which includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator. (RDC 10/11/2012)
Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
Albrecht and Ruiz of Hitachi Global Storage Technologies Netherlands B.V., Netherlands, developed a method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks. The method uses conventional optical or e-beam lithography to form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines of alternating block copolymer components. The radial lines of one of the components are removed and the radial lines of the remaining component are used as an etch mask to etch the substrate. Conventional lithography is used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands. The block copolymer may be a diblock copolymer of A and B components having the structure (A-b-B), such as polystyrene-block-polymethylmethacrylate (PS-b-PMMA). The ratio of the molecular weight of the A component to the molecular weight of the B component is selected so that the radial lines of the A component are formed either as cylinders in a matrix of the B component or as alternating lamellae separated by alternating lamellae of the B component. (RDC 9/10/2012)
Imprinting device and imprinting method
Takaya et al of Scivax Corporation, Japan, developed an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object. (RDC 7/24/2012)
Methods for fabricating large area nanoimprint molds
Chou et al, New Jersey, fabricated large area nanoimprint molds having complex patterns with minimal or no use of direct-writing, such as electron beam lithography, ion, laser beam, or mechanical beam lithography. A pattern of simple nanoscale features is formed and converted into more complex nanoscale features by a process comprising shadow deposition. The process may also include steps of uniform deposition, etching and smoothing depending on the shape of the complex features. (RDC 6/18/2012)
Mold and method for manufacturing the same
Hashimoto et al of Pioneer Corporation, Japan, developed a mold with an outer circumferential region for pripping, to allow a transfer apparatus to perform transferring to an object. T he portions to be gripped are formed in a different shape from the remaining portion of the outer circumferential region. For a mold set including two molds, each of the molds is provided, at an outer circumferential region thereof, with portions to be gripped, to allow the transfer apparatus to perform transferring to the object. The portions to be gripped are formed in a different shape from the remaining portion of the outer circumferential region. The portions to be gripped of one of the molds and the portions to be gripped of the other mold are disposed at different angular positions. (RDC 6/18/2012)
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Roger D. Corneliussen
Maro Polymer Links
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Copyright 2012 by Roger D. Corneliussen.
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** Date of latest addition; date of first entry is 6/18/2012.