Maro Publications

Polyhedral Oligomeric Silsesquioxane (POSS)

Patent Abstracts

from 7/15/2012

Maro Topics


Patents with Abstracts

Polymers made from polyhedral oligomeric silsesquioxanes and diacetylene-containing compounds
Kolel-Veetil and Keller of the US Navy, Washingtion, District of Columbia,  developed a silsesquioxanes with methyl or phenyl; R2 such as silane, siloxane, and aromatic groups.  The dashed bond is a single bond and the double dashed bond is a double bond, or the dashed bond is a double bond and the double dashed bond is a triple bond. A polymer made by a hydrosilation reaction of a polyhedral oligomeric silsesquioxane having pendant siloxane groups with an acetylene- and silicon-containing compound having at least two vinyl or ethynyl groups, and a crosslinked polymer thereof. The reaction occurs between the pendant siloxane groups and the vinyl or ethynyl groups.  (RDC 7/10/2012)


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(RDC 6/5/2012)


Roger D. Corneliussen

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Copyright 2012 by Roger D. Corneliussen.
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** Date of latest addition; date of first entry is 7/15/2012.