Maro Publications



from 4/5/2013

Maro Encyclopedia


Patent Abstracts

Patent Titles




3. Control Agents

“Block copolymers films can be used as a part of an assembly system, in which nanoscale features form when blocks of the block copolymers phase separate into microdomains (also referred to herein as "microphase-separated domains" or "domains") to reduce the total free energy. Such thin films of block copolymers provide features having spatial chemical contrast at nanometer-scale, and consequently by their ability to generate these periodic nanoscale structures have been used as a low-cost material for nanopatterning. One problem in block copolymer patterning is controlling the orientation of the assembled microdomains. Without external orientation control, thin films of block copolymers tend to organize into randomly oriented nanostructures or undesired morphologies, which are of no use for nanopatterning because of the random nature of the features.” [Patterning, US Patent 8,491,2013 (7/23/2013)]


2. Patterns

 “A pattern, apart from the term's use to mean "Template" is a discernible regularity in the world or in a manmade design. As such, the elements of a pattern repeat in a predictable manner.

Any of the five senses may directly observe patterns. Conversely, abstract patterns in science, mathematics, or language may be observable only by analysis. Direct observation in practice means seeing visual patterns, which are widespread in nature and in art. Visual patterns in nature are often chaotic, never exactly repeating, and often involve fractals. Natural patterns include spirals, meanders, waves, foams, tilings, cracks, and those created by symmetries of rotation and reflection. All such patterns have an underlying mathematical structure; indeed, mathematics can be seen as the search for regularities, and the output of any function is a mathematical pattern. Similarly in the sciences, theories explain and predict regularities in the world.

In art and architecture, decorations or visual motifs may be combined and repeated to form patterns designed to have a chosen effect on the viewer. In computer science, a software design pattern is a known solution to a class of problems in programming. In fashion, the pattern is a template) used to create any number of similar garments.”

(Patterns, Wikipedia, 4//14/2013)


1. Photolithography

“Photolithography is a conventional method utilized for fabrication of integrated components. Photolithography utilizes light to pattern a photosensitive material. The photolithographically-patterned photosensitive material may then be utilized as a mask for patterning underlying materials to form integrated circuit components.

If only photolithography is utilized to pattern integrated circuit components, integrated circuit density cannot increase beyond a threshold dictated by the minimum attainable feature size obtainable utilizing the photolithography. The minimum feature size may be dictated by, for example, a wavelength utilized during the photolithography.

Several methods have been developed which can be utilized in combination with photolithography to push the minimum attainable feature size to smaller dimensions than may be achieved with photolithography alone. Among such methods is a procedure comprising utilization of a block copolymer to form a pattern within photolithographically-patterned features. The pattern created with the block copolymer may be at higher density than is achievable with photolithographic patterning, and thus may be utilized to create higher integrated circuit densities than are achievable with photolithography alone.

Although the utilization of block copolymers shows promise for increasing integrated circuit density, there are technical obstacles to overcome before block copolymers are adopted for wide-scale use in semiconductor device fabrication.”

[Sills and Millward of Micron Technology, Inc., Idaho, US Patent 8,394,579 (3/12/2013)]


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(RDC 6/5/2012)


Roger D. Corneliussen

Maro Polymer Links
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Copyright 2013 by Roger D. Corneliussen.
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* Date of latest addition; date of first entry is 4/5/2013.