Maro Publications

Resists

Patent Titles

From 06/23/2015  through 2/26/2013

Maro Encyclopedia

Patent Abstracts

Patent Notes

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Patent Titles

For earlier US Patent titles, go to Sorted Patents /Decorating /Resists.

3/24/2015

8,987,386
Method of producing polymeric compound, resist composition, and method of forming resist pattern

3/3/2015

8,969,483
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

8,968,458
Composition for resist underlayer film and process for producing same

2/24/2015

8,962,747
Resist underlayer composition and process of producing integrated circuit devices using the same

2/17/2015

8,957,160
Preparation of polymer, resulting polymer, resist composition, and patterning process

8,956,807
Method for forming resist pattern, and composition for forming resist underlayer film

8,956,806
Photoresist and patterning process

8,956,804
Self-assemblable polymer and methods for use in lithography

8,956,803
Sulfonium salt, resist composition, and patterning process

8,956,802
Pattern forming method, chemical amplification resist composition and resist film

8,956,801
Resist composition and method of forming resist pattern

8,956,800
Resist composition and method of forming resist pattern

8,956,799
Photoacid generator and photoresist comprising same

8,956,560
Method of manufacturing mold

2/10/2015

8,951,917
Composition for forming resist underlayer film and patterning process using the same

8,951,890
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

8,951,713
Alkali-soluble resin and negative-type photosensitive resin composition comprising the same

8,951,712
Resist protective film-forming composition and patterning process

8,951,710
Chemically amplified negative resist composition and patterning process

8,951,709
Resist composition and method for producing resist pattern

8,951,609
CNT devices, low-temperature fabrication of CNT and CNT photo-resists

1/27/2015

8,940,472
Coating compositions suitable for use with an overcoated photoresist

8,940,470
Photosensitive resin and process for producing microlens

1/6/2015

8,927,058
Photoresist coating process

8,926,740
Pigment dispersion, and resist composition for color filter and ink composition each using the pigment dispersion

12/23/2014

8,916,333
Radiation-sensitive resin composition

8,916,332
Resist composition, method of forming resist pattern, and polymeric compound

12/16/2014

8,911,587
Photoresist double patterning apparatus

12/9/2014

8,906,591 
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same 

8,906,589 
Salt and photoresist composition comprising the same 

12/2/2014

8,900,796 
Acid generator, chemically amplified resist composition, and patterning process 

8,900,795 
Resist composition, method of forming resist pattern and novel compound 

8,900,794 
Photoacid generator and photoresist comprising same 

8,900,792 
Polymerizable photoacid generators 

8,900,791 
Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition 

8,900,790 
Photoresist composition 

8,900,789 
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 

8,900,788 
Resist composition for immersion exposure and method of forming resist pattern 

11/25/2014

8,895,227  Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern 

8,895,226  Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method 

8,895,223 
Radiation-sensitive resin composition 

8,895,222 
Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition 

11/11/2014

8,883,937 
Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern 

8,883,407 
Coating compositions suitable for use with an overcoated photoresist 

8,883,394 
Chemically amplified photoresist composition and method for forming resist pattern 

8,883,379 
Resist-protective film-forming composition and patterning process 

8,883,374 
EUV photoresist encapsulation 

11/04/2014

8,877,429 
Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same 

8,877,424 
Monomer, polymer, resist composition, and patterning process 

10/21/2014

8,864,894 
Resist underlayer film forming composition containing silicone having onium group 

10/14/2014

8,859,194 
Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process 

8,858,681 
Patterned porous venting materials 

12/24/2013

65. 8,614,283 
Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer 

64. 8,614,051 
Photosensitive resin composition and circuit formation substrate using the same 

63. 8,614,050 
Polymers, photoresist compositions and methods of forming photolithographic patterns 

62. 8,614,049 
Resist composition and method of forming resist pattern 

12/17/2013

61. 8,609,321 
Radiation-sensitive resin composition, polymer and compound 

60. 8,609,320 
Resist composition, method of forming resist pattern, polymeric compound and compoun

59. 8,609,319 
Radiation-sensitive resin composition and resist film formed using the same 

58. 8,609,318
Radiation-sensitive resin composition, method for forming resist pattern and polymer 

57. 8,609,317 
Salt and photoresist composition containing the same 

12/10/2013

56. 8,603,728 
Polymer composition and photoresist comprising the polymer 

11/26/2013

55. 8,592,134 
Composition for forming base film for lithography and method for forming multilayer resist pattern 

54. 8,592,133 
Resist composition and patterning process 

53. 8,592,132 
Resist composition and method for producing resist pattern 

52. 8,592,130 
Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board 

51. 8,592,129 
Resin, resist composition and method for producing resist pattern 

50. 8,592,128 
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 

11/19/2013

49. 8,586,284 
Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board 

48. 8,586,282 
Resist composition and patterning process 

47. 8,586,281 
Positive resist composition and method of forming resist pat

11/12/2013

46. 8,580,915 
Process for preparing stable photoresist compositions 

45. 8,580,340 
Substrate processing apparatus and substrate processing method 

10/29/2013

44. 8,568,956 
Resist composition and method for producing resist pattern 

10/8/2013

43. 8,551,686 
Antireflective composition for photoresists 

42. 8,551,684 
Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition 

10/1/2013

41. 8,546,062 
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same 

9/24/2013

40. 8,541,529 
Positive resist composition, method of forming resist pattern, and polymeric compound 

9/17/2013

39. 8,536,270 
Resist composition, resist layer, imprinting method, pattern formation, method for producing magnetic recording medium, and magnetic recording medium 

7/9/2013

38. 8,481,243 
Resin and photoresist composition comprising the same 

6/4/2013

37. 8,455,596 
Method for producing a copolymer for photoresis

36. 8,455,039 
Photoresist-coating apparatus and photoresist-coating method using the same

35. 8,453,599 
Resist solution supply apparatus, resist solution supply method, and computer storage medium 

5/21/2013   

34. 8,445,175 
Composition containing hydroxylated condensation resin for forming resist underlayer film 

5/14/2013   

33. 8,440,734 
Positive photosensitive resin composition, cured film, protecting film, insulating film, and semiconductor device and display device using the same

32. 8,440,385 
Positive resist composition, method of forming resist pattern and polymeric compound 

5/7/2013 

31. 8,435,719 
Tunable contact angle process for immersionlithography topcoats and photoresists 

30. 8,435,721 
Resist underlayer film forming composition and forming method of resist pattern using the same 

29. 8,435,718 
Upper layer-forming composition and photoresist patterning method 

4/23/2013

28. 8,426,113 
Chemically amplified silsesquioxane resist compositions 

27. 8,426,112 
Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group 

26. 8,426,111 
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating 

25. 8,426,110 
Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound 

24. 8,426,109 
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same 

23. 8,426,108 
Chemically amplified positive resist composition for EB or EUV lithography and patterning process 

22. 8,426,107 
Positive-type photosensitive composition 

21. 8,426,106 
Photoresist composition 

20. 8,426,105 
Resist-modifying composition and pattern forming process 

4/16/2013

19. 8,420,304 
Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method 

18. 8,420,296 
Photoresist composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same 

17. 8,420,294 
Salt and photoresist composition comprising the same 

16. 8,420,292 
Polymer, resist composition, and patterning process 

15. 8,420,291 
Positive photosensitive resin composition, method for forming pattern, electronic component 

14. 8,420,290 
Acetal compounds and their preparation, polymers, resist compositions and patterning process 

13. 8,420,288 
Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same 

4/9/2013

12. 8,415,424 
Aromatic ring-containing polymer for underlayer of resist and resist underlayer composition including the same 

4/2/2013

11. 8,409,787 
Method of forming a pattern in a semiconductor device and method of forming a gate using the same 

10. 8,409,786 
Pattern forming method and method for manufacturing semiconductor device 

9. 8,409,785 
Apparatus and method for treating imaging materials 

8. 8,409,784 
Photosensitive resin composition, dry film, and processed product made using the same 

7. 8,409,782 
Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition 

6. 8,409,781 
Composition for formation of resist protection film, and method for formation of resist pattern using the same 

5. 8,409,778 
Resin coated carrier, two-component developer, developing device and image forming apparatus 

3/19/2013

4. 8,399,173 
Resist composition and resist pattern forming method 

3/12/2013

3. 8,393,885 
Processing apparatus 

3/5/2013

2. 8,387,255 
Fine pattern mold 

2/26/2013

1. 8,383,318 
Acid-sensitive, developer-soluble bottom anti-reflective coatings 

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Interested!!
Bookmark this page to follow future developments!.
(RDC 6/5/2012)

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Roger D. Corneliussen
Editor
www.maropolymeronline.com

Maro Polymer Links
Tel: 610 363 9920
Fax: 610 363 9921
E-Mail: cornelrd@bee.net  

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Copyright 2013 by Roger D. Corneliussen.
No part of this transmission is to be duplicated in any manner or forwarded by electronic mail without the express written permission of Roger D. Corneliussen
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** Date of latest addition; date of first entry is 3/5/2013.